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    248NM Search Results

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    248NM Price and Stock

    ebm-papst

    ebm-papst 6248NM

    FAN AXL 171.5X50.8MM 48VDC TERM
    Distributors Part Package Stock Lead Time Min Order Qty Price Buy
    DigiKey 6248NM Box 1
    • 1 $116.61
    • 10 $94.28
    • 100 $87.95
    • 1000 $87.95
    • 10000 $87.95
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    Avnet Americas 6248NM Bulk 19 Weeks 32
    • 1 -
    • 10 -
    • 100 $92.58
    • 1000 $79.06
    • 10000 $79.06
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    Mouser Electronics 6248NM 1
    • 1 $108.68
    • 10 $94.28
    • 100 $93.59
    • 1000 $93.59
    • 10000 $93.59
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    Newark () 6248NM Bulk 32
    • 1 -
    • 10 -
    • 100 $127.02
    • 1000 $127.02
    • 10000 $127.02
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    6248NM Bulk 1
    • 1 $119.98
    • 10 $113.98
    • 100 $101.98
    • 1000 $101.98
    • 10000 $101.98
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    RS 6248NM Bulk 13 Weeks 1
    • 1 $118.94
    • 10 $118.94
    • 100 $118.94
    • 1000 $118.94
    • 10000 $118.94
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    IBS Electronics 6248NM 2 2
    • 1 -
    • 10 $95.08
    • 100 $87.95
    • 1000 $87.95
    • 10000 $87.95
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    Master Electronics 6248NM
    • 1 $102.57
    • 10 $95.67
    • 100 $84.16
    • 1000 $84.16
    • 10000 $84.16
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    Sager 6248NM 44 1
    • 1 $101.06
    • 10 $95.67
    • 100 $83.52
    • 1000 $83.52
    • 10000 $83.52
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    248NM Datasheets Context Search

    Catalog Datasheet Type Document Tags PDF

    dlp dmd chip

    Abstract: UV LED 280NM .55" dmd chip chip dmd LCOS pico projector 311nm led uv 280nm dlp mirror chip Laser video projector infrared cmos digital image
    Contextual Info: DLP Introduction 1 Topics • DMD Trivia Digital Micromirror Device • How does DLP Work? • New Application Areas 2 DMD – Heart of the DLP® Technology Lifetime >100,000 hrs Number of Mirrors 480,000 to >2,000,000 Mechanical Elements Aluminum Mechanical


    Original     		PDF

    Treadmill

    Abstract: POWER SUPPLY for Treadmill ionizer teflon af asahi glass delay line u-key hydrocarbon polymeric symposium NIKON 13Nm
    Contextual Info: 157-nm Lithography for 100-nm Node Challenges and Progress G. Dao and Y. Borodovsky Acknowledgment The Japan Electronic Journal P. Gargini, P. Silverman, F. C. Lo, A. Grenville, L. Liao, E. Panning, Orvek, and J.F. Zheng R =


    Original     		157-nm 100-nm Treadmill POWER SUPPLY for Treadmill ionizer teflon af asahi glass delay line u-key hydrocarbon polymeric symposium NIKON 13Nm PDF

    211-HSG-D09-SR

    Abstract: 212-PINFHD-26
    Contextual Info: Company Profile DE: UK: F: Info@allectra.com uk@allectra.com fr@allectra.com Allectra – Mechanical, Electrical and Optical Components for UHV and High Vacuum COMPANY HISTORY Allectra GmbH was founded in 2002 in Berlin. Within the first year, the range of Sub-D Feedthroughs and associated


    Original     		PDF

    Traveling Wave Amplifier

    Abstract: 95GH Dielectric Constant Silicon Nitride MMIC POWER AMPLIFIER hemt APMC2001 FMM5820X HMC-AUH312 TGA4803 TGA4906 InGaAs hemt biasing
    Contextual Info: DC to 85GHz TWA and Ka-band 4.9W Power Amplifier Using an Optical Lithography Based Low Cost PHEMT Process Kohei Fujii, John Stanback, and Henrik Morkner White Paper Abstract Overview of The Mmic Process An optical photo lithography based 0.15 m GaAs PHEMT


    Original     		85GHz 575mA/mm, 753mW/mm 18GHz. 12dBm AV02-1684EN Traveling Wave Amplifier 95GH Dielectric Constant Silicon Nitride MMIC POWER AMPLIFIER hemt APMC2001 FMM5820X HMC-AUH312 TGA4803 TGA4906 InGaAs hemt biasing PDF

    sartorius

    Abstract: AR237J PAR710 D9000 ellipsometer photoresist
    Contextual Info: 193nm CD shrinkage under SEM: modeling the mechanism Andrew Habermas1, Dongsung Hong1, Matthew Ross2, William Livesay2 Cypress Semiconductor, 2401 East 86th St, Bloomington, MN 55425 2 Electron Vision Corp., 10119 Carroll Canyon Road, San Diego, CA 92131-1109l


    Original     		193nm 92131-1109l 248nm sartorius AR237J PAR710 D9000 ellipsometer photoresist PDF

    ipl xenon

    Abstract: gore membrane vents power supply for magnetron 80-wafer-per-hour schematic diagram of ip camera ,ipl xenon spy camera circuit diagram spy camera schematic diagram intel atom carl zeiss
    Contextual Info: MICROPROCESSOR REPORT www.MPRonline.com T H E I N S I D E R ’ S G U I D E T O M I C R O P R O C E S S O R H A R D WA R E EXTREME LITHOGRAPHY Intel Backs EUV for Next-Generation Lithography By Ke ith D ie fe ndor ff {6/19/00-01} Working at the very boundary between theoretical physics and practical engineering, scientists at Lawrence Livermore, Sandia, and Lawrence Berkeley National Laboratories


    Original     		PDF