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MeadorSPIEAL2008reprint - Proceedings of SPIE David Drain , Ramil-Marcelo L. Mercado , Douglas J. Guerrero , Zhimin Zhu , Joyce A. Lowes , Charlyn Stroud , Carol Beaman , Jim D. Meador, "Dual-layer dye-filled developer-soluble BARCs for 193-nm lithography," Proceedings of SPIE, 20 - Publications
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