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SPIE2007PreprintPhotoKrF-Mercado - Proceedings of SPIE Douglas J. Guerrero , Carlton A. Washburn , Joyce A. Lowes , Ramil-Marcelo L. Mercado, "A novel approach to developer-soluble anti-reflective coatings for 248-nm lithography," Proceedings of SPIE, 2007, pp. 65192X-1 - 65192X-10 - Publications
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