Thin Film Equipment
Veeco creates process equipment that enables technologies for a cleaner and more productive world. We design, manufacture and market thin film equipment aligned with global trends, such as energy efficiency, mobility and the internet-of-things. We develop highly differentiated, best-in-class equipment for critical high-tech performance steps in thin film processing.
| Datasheet | PDF or ZIP |
|---|---|
| 1774aa29cd2a51be3ae20d1ab230f966 - Veeco PSP White Paper: Wet Etch TSV Reveal Process More Cost Effective Than Dry Etch - Advanced Packaging | 1774aa29cd2a51be3ae20d1ab230f966 : Veeco PSP White Paper: Wet Etch TSV Reveal Process More Cost Effective Than Dry Etch (PDF) |
| D32be4fa52a5ba5127b54db7e087798c - Detailed explanation of the EEO is the Law Poster (English) | D32be4fa52a5ba5127b54db7e087798c : Detailed explanation of the EEO is the Law Poster (English) (PDF) |
| Ce2f2d6b9305a18efc8c6e17fa4aef50 - Introducing the New TurboDisc EPIK700 MOCVD System - LED | Ce2f2d6b9305a18efc8c6e17fa4aef50 : Introducing the New TurboDisc EPIK700 MOCVD System (PDF) |
| 9e9d96b6dae289f033ef365b63dc81f5 - Chip Scale Review - Advances in Photoresist Stripping - Advanced Packaging | 9e9d96b6dae289f033ef365b63dc81f5 : Chip Scale Review - Advances in Photoresist Stripping (PDF) |
| Dfd2ce14d251c4e7cbc32ab16f42a489 - TurboDisc GaN MOCVD System Comparison - LED | Dfd2ce14d251c4e7cbc32ab16f42a489 : TurboDisc GaN MOCVD System Comparison (PDF) |
| 6c85fa1bad35f91ec3d242c0a9d8ca4f - Silicon Semiconductor - Wet Beats Dry in 3D Backside Process Study - Advanced Packaging | 6c85fa1bad35f91ec3d242c0a9d8ca4f : Silicon Semiconductor - Wet Beats Dry in 3D Backside Process Study (PDF) |
| 5ff68c28300e8ec266da97cd3403f191 - GENxplor R&D MBE System Data Sheet - Materials Science | 5ff68c28300e8ec266da97cd3403f191 : GENxplor R&D MBE System Data Sheet (PDF) |
| 5ca0a0fa19e21ffd1b9ba3d7704f1ff3 - Etch, Deposition, and Metrology Options for Cost-Effective Thin-Film Bulk Acoustic Resonator (FBAR) Production - MEMS | 5ca0a0fa19e21ffd1b9ba3d7704f1ff3 : Etch, Deposition, and Metrology Options for Cost-Effective Thin-Film Bulk Acoustic Resonator (FBAR) Production (PDF) |
| F8f7e3c6a35c178fee873cc6bdcf37bd - Detailed explanation of t he EEO is the Law Supplemental Poster | F8f7e3c6a35c178fee873cc6bdcf37bd : Detailed explanation of t he EEO is the Law Supplemental Poster (PDF) |
| 4fc8f4d8569ce63940b91ec5f16a7f98 - TurboDisk EPIK®700 GaN MOCVD System - LED | 4fc8f4d8569ce63940b91ec5f16a7f98 : TurboDisk EPIK®700 GaN MOCVD System (PDF) |
| Cd5ee82689d0f787e02d40131afb37ed - Veeco PROPEL Power GaN MOCVD System - Power Electronics | Cd5ee82689d0f787e02d40131afb37ed : Veeco PROPEL Power GaN MOCVD System (PDF) |
| Cc2886fd9ed0dd1e975b94ebc1ecae90 - Ion Beam Sputtering Deposition of Fluoride Thin Films for 193 nm Applications - Optical | Cc2886fd9ed0dd1e975b94ebc1ecae90 : Ion Beam Sputtering Deposition of Fluoride Thin Films for 193 nm Applications (PDF) |
| B28cbd6633c11142021dad288517e059 - Oxygen Resistant Components - Materials Science | B28cbd6633c11142021dad288517e059 : Oxygen Resistant Components (PDF) |
| 172c705b81647493fd285a986676e08e - Advanced Sensor Fabrication Using Integrated Ion Beam Etch and Ion Beam Deposition Processes - MEMS | 172c705b81647493fd285a986676e08e : Advanced Sensor Fabrication Using Integrated Ion Beam Etch and Ion Beam Deposition Processes (PDF) |
| 1aaafedf15e42b02cde1c4ce2ab50ac8 - TurboDisc K465i GaN MOCVD Data Sheet - LED | 1aaafedf15e42b02cde1c4ce2ab50ac8 : TurboDisc K465i GaN MOCVD Data Sheet (PDF) |
| Db255f6c3a467f19a7fb42a01b192dfa - Accelerating Silicon Carbide Power Electronics Devices into High Volume Manufacturing with Mechanical Dicing System - Power Electronics | Db255f6c3a467f19a7fb42a01b192dfa : Accelerating Silicon Carbide Power Electronics Devices into High Volume Manufacturing with Mechanical Dicing System (PDF) |
| Be5b96d236a7e100d2af4c0d833a072b - Pay Transparency Nondiscrimination Provision | Be5b96d236a7e100d2af4c0d833a072b : Pay Transparency Nondiscrimination Provision (PDF) |
| 04fb4083f6c2ec42f8df91544628fe24 - Gas Source Delivery Solutions - Materials Science | 04fb4083f6c2ec42f8df91544628fe24 : Gas Source Delivery Solutions (PDF) |
| 1774aa29cd2a51be3ae20d1ab230f966 - Veeco PSP White Paper: Wet Etch TSV Reveal Process More Cost Effective Than Dry Etch - MEMS | 1774aa29cd2a51be3ae20d1ab230f966 : Veeco PSP White Paper: Wet Etch TSV Reveal Process More Cost Effective Than Dry Etch (PDF) |
| 436f23f511a01a74678b74f3dde40b4c - P MOCVD System Data Sheet - LED | 436f23f511a01a74678b74f3dde40b4c : P MOCVD System Data Sheet (PDF) |
| 6447cae1dc4dd1979745dadb0433ea9f - Solutions for Carbon Doping - Materials Science | 6447cae1dc4dd1979745dadb0433ea9f : Solutions for Carbon Doping (PDF) |
| C67cdf58bd4c1e19d60b7bd12a61a741 - Improvement of Dopany Concentration Control with Acoustic Control System for B-SiGe Epitaxy Deposition - Semiconductor | C67cdf58bd4c1e19d60b7bd12a61a741 : Improvement of Dopany Concentration Control with Acoustic Control System for B-SiGe Epitaxy Deposition (PDF) |
| 1774aa29cd2a51be3ae20d1ab230f966 - Veeco PSP White Paper: Wet Etch TSV Reveal Process More Cost Effective Than Dry Etch | 1774aa29cd2a51be3ae20d1ab230f966 : Veeco PSP White Paper: Wet Etch TSV Reveal Process More Cost Effective Than Dry Etch (PDF) |
| 9e9d96b6dae289f033ef365b63dc81f5 - Chip Scale Review - Advances in Photoresist Stripping - MEMS | 9e9d96b6dae289f033ef365b63dc81f5 : Chip Scale Review - Advances in Photoresist Stripping (PDF) |
| 514fba46a7da5e111bcb1e5f982d572a - Phosphorus Recovery System - Materials Science | 514fba46a7da5e111bcb1e5f982d572a : Phosphorus Recovery System (PDF) |
| E3af60a66765bc7706a90fc413e6b2e4 - Apex Gas Mixing Solution - Semiconductor | E3af60a66765bc7706a90fc413e6b2e4 : Apex Gas Mixing Solution (PDF) |
| 9e9d96b6dae289f033ef365b63dc81f5 - Chip Scale Review - Advances in Photoresist Stripping | 9e9d96b6dae289f033ef365b63dc81f5 : Chip Scale Review - Advances in Photoresist Stripping (PDF) |
| 6c85fa1bad35f91ec3d242c0a9d8ca4f - Silicon Semiconductor - Wet Beats Dry in 3D Backside Process Study - MEMS | 6c85fa1bad35f91ec3d242c0a9d8ca4f : Silicon Semiconductor - Wet Beats Dry in 3D Backside Process Study (PDF) |
| C502b0bb16a2d94be3027afe7361c8d6 - Ammonia Resistant Components - Materials Science | C502b0bb16a2d94be3027afe7361c8d6 : Ammonia Resistant Components (PDF) |
| 229aee653a30dd829eb4520d44c955f7 - WaferStorm Data Sheet - Semiconductor | 229aee653a30dd829eb4520d44c955f7 : WaferStorm Data Sheet (PDF) |
| 6c85fa1bad35f91ec3d242c0a9d8ca4f - Silicon Semiconductor - Wet Beats Dry in 3D Backside Process Study | 6c85fa1bad35f91ec3d242c0a9d8ca4f : Silicon Semiconductor - Wet Beats Dry in 3D Backside Process Study (PDF) |
| 989a0d36580d441876689a8bc128e252 - Automated Valve Positioner - Materials Science | 989a0d36580d441876689a8bc128e252 : Automated Valve Positioner (PDF) |
| 1a3cf26b60895704680f11695413afb2 - WaferEtch Data Sheet - Semiconductor | 1a3cf26b60895704680f11695413afb2 : WaferEtch Data Sheet (PDF) |
| Ebf15a2e7c3d7c33cd91fa982fd9150b - DC Power Supply with PID Temperature Controller - Materials Science | Ebf15a2e7c3d7c33cd91fa982fd9150b : DC Power Supply with PID Temperature Controller (PDF) |
| 1774aa29cd2a51be3ae20d1ab230f966 - Veeco PSP White Paper: Wet Etch TSV Reveal Process More Cost Effective Than Dry Etch - Semiconductor | 1774aa29cd2a51be3ae20d1ab230f966 : Veeco PSP White Paper: Wet Etch TSV Reveal Process More Cost Effective Than Dry Etch (PDF) |
| 72c506e4143046e8ac778bd036c62249 - SMC-II Growth Stage Positioner - Materials Science | 72c506e4143046e8ac778bd036c62249 : SMC-II Growth Stage Positioner (PDF) |
| Bf3c1e298b88985358c35dadf9f1a64e - Low Ripple Notch Filter Designs Using Apodized Thickness Modulation - Optical | Bf3c1e298b88985358c35dadf9f1a64e : Low Ripple Notch Filter Designs Using Apodized Thickness Modulation (PDF) |
| 9e9d96b6dae289f033ef365b63dc81f5 - Chip Scale Review - Advances in Photoresist Stripping - Semiconductor | 9e9d96b6dae289f033ef365b63dc81f5 : Chip Scale Review - Advances in Photoresist Stripping (PDF) |
| 8d0ba4cc9596c2c34579d58001b5a0d5 - 5cc Dual Dopant Source Data Sheet - Materials Science | 8d0ba4cc9596c2c34579d58001b5a0d5 : 5cc Dual Dopant Source Data Sheet (PDF) |
| C3fe281173ed7e4a7c06d39c2b151116 - SPECTOR-HT Data Sheet - Optical | C3fe281173ed7e4a7c06d39c2b151116 : SPECTOR-HT Data Sheet (PDF) |
| 6c85fa1bad35f91ec3d242c0a9d8ca4f - Silicon Semiconductor - Wet Beats Dry in 3D Backside Process Study - Semiconductor | 6c85fa1bad35f91ec3d242c0a9d8ca4f : Silicon Semiconductor - Wet Beats Dry in 3D Backside Process Study (PDF) |
| 9f176b0b3fa99aac6670d77a212bf675 - Nova Ultra High Temperature Substrate Heater - Materials Science | 9f176b0b3fa99aac6670d77a212bf675 : Nova Ultra High Temperature Substrate Heater (PDF) |
| 61e190c941a5910f50bc072113ee24ab - Quest OMS Data Sheet - Optical | 61e190c941a5910f50bc072113ee24ab : Quest OMS Data Sheet (PDF) |
| 436f23f511a01a74678b74f3dde40b4c - P MOCVD System Data Sheet - Learn More. | 436f23f511a01a74678b74f3dde40b4c : P MOCVD System Data Sheet (PDF) |
| Ea0e8ce602c635d884002ac9733a759c - Benefits here. - Valuing Our People | Ea0e8ce602c635d884002ac9733a759c : Benefits here. (PDF) |
| Cd5ee82689d0f787e02d40131afb37ed - Veeco PROPEL Power GaN MOCVD System - Propel Power GaN MOCVD System for Power Electronics | Cd5ee82689d0f787e02d40131afb37ed : Veeco PROPEL Power GaN MOCVD System (PDF) |
| 229aee653a30dd829eb4520d44c955f7 - WaferStorm Data Sheet - Precision Surface Processing - WaferStorm | 229aee653a30dd829eb4520d44c955f7 : WaferStorm Data Sheet (PDF) |
| 9e9d96b6dae289f033ef365b63dc81f5 - Chip Scale Review - Advances in Photoresist Stripping - Precision Surface Processing - WaferStorm | 9e9d96b6dae289f033ef365b63dc81f5 : Chip Scale Review - Advances in Photoresist Stripping (PDF) |
| 6c85fa1bad35f91ec3d242c0a9d8ca4f - Silicon Semiconductor - Wet Beats Dry in 3D Backside Process Study - Precision Surface Processing - WaferStorm | 6c85fa1bad35f91ec3d242c0a9d8ca4f : Silicon Semiconductor - Wet Beats Dry in 3D Backside Process Study (PDF) |
| Cc2886fd9ed0dd1e975b94ebc1ecae90 - Ion Beam Sputtering Deposition of Fluoride Thin Films for 193 nm Applications - SPECTOR-HT Ion Beam Sputtering System for Optical Coating | Cc2886fd9ed0dd1e975b94ebc1ecae90 : Ion Beam Sputtering Deposition of Fluoride Thin Films for 193 nm Applications (PDF) |
| Cc2886fd9ed0dd1e975b94ebc1ecae90 - Ion Beam Sputtering Deposition of Fluoride Thin Films for 193 nm Applications - SPECTOR Loadlock Ion Beam Sputtering System for Optical Coating | Cc2886fd9ed0dd1e975b94ebc1ecae90 : Ion Beam Sputtering Deposition of Fluoride Thin Films for 193 nm Applications (PDF) |
| Cc2886fd9ed0dd1e975b94ebc1ecae90 - Ion Beam Sputtering Deposition of Fluoride Thin Films for 193 nm Applications - SPECTOR Ion Beam Deposition Sputtering for Optical Coating | Cc2886fd9ed0dd1e975b94ebc1ecae90 : Ion Beam Sputtering Deposition of Fluoride Thin Films for 193 nm Applications (PDF) |
| Ce2f2d6b9305a18efc8c6e17fa4aef50 - Introducing the New TurboDisc EPIK700 MOCVD System - TurboDisc EPIK 700 GaN MOCVD System for LED Production | Ce2f2d6b9305a18efc8c6e17fa4aef50 : Introducing the New TurboDisc EPIK700 MOCVD System (PDF) |
| Bf3c1e298b88985358c35dadf9f1a64e - Low Ripple Notch Filter Designs Using Apodized Thickness Modulation - SPECTOR-HT Ion Beam Sputtering System for Optical Coating | Bf3c1e298b88985358c35dadf9f1a64e : Low Ripple Notch Filter Designs Using Apodized Thickness Modulation (PDF) |
| Bf3c1e298b88985358c35dadf9f1a64e - Low Ripple Notch Filter Designs Using Apodized Thickness Modulation - SPECTOR Ion Beam Deposition Sputtering for Optical Coating | Bf3c1e298b88985358c35dadf9f1a64e : Low Ripple Notch Filter Designs Using Apodized Thickness Modulation (PDF) |
| Bf3c1e298b88985358c35dadf9f1a64e - Low Ripple Notch Filter Designs Using Apodized Thickness Modulation - SPECTOR Loadlock Ion Beam Sputtering System for Optical Coating | Bf3c1e298b88985358c35dadf9f1a64e : Low Ripple Notch Filter Designs Using Apodized Thickness Modulation (PDF) |
| Dfd2ce14d251c4e7cbc32ab16f42a489 - TurboDisc GaN MOCVD System Comparison - TurboDisc EPIK 700 GaN MOCVD System for LED Production | Dfd2ce14d251c4e7cbc32ab16f42a489 : TurboDisc GaN MOCVD System Comparison (PDF) |
| Cc2886fd9ed0dd1e975b94ebc1ecae90 - Ion Beam Sputtering Deposition of Fluoride Thin Films for 193 nm Applications - SPECTOR Large Area Ion Beam Deposition System for Optical Coating | Cc2886fd9ed0dd1e975b94ebc1ecae90 : Ion Beam Sputtering Deposition of Fluoride Thin Films for 193 nm Applications (PDF) |
| E3af60a66765bc7706a90fc413e6b2e4 - Apex Gas Mixing Solution - Apex Gas Mixing System | E3af60a66765bc7706a90fc413e6b2e4 : Apex Gas Mixing Solution (PDF) |
| 4fc8f4d8569ce63940b91ec5f16a7f98 - TurboDisk EPIK®700 GaN MOCVD System - TurboDisc EPIK 700 GaN MOCVD System for LED Production | 4fc8f4d8569ce63940b91ec5f16a7f98 : TurboDisk EPIK®700 GaN MOCVD System (PDF) |
| Bf3c1e298b88985358c35dadf9f1a64e - Low Ripple Notch Filter Designs Using Apodized Thickness Modulation - SPECTOR Large Area Ion Beam Deposition System for Optical Coating | Bf3c1e298b88985358c35dadf9f1a64e : Low Ripple Notch Filter Designs Using Apodized Thickness Modulation (PDF) |
| C3fe281173ed7e4a7c06d39c2b151116 - SPECTOR-HT Data Sheet - SPECTOR-HT Ion Beam Sputtering System for Optical Coating | C3fe281173ed7e4a7c06d39c2b151116 : SPECTOR-HT Data Sheet (PDF) |
| C67cdf58bd4c1e19d60b7bd12a61a741 - Improvement of Dopany Concentration Control with Acoustic Control System for B-SiGe Epitaxy Deposition - Piezocon Gas Concentration Sensor | C67cdf58bd4c1e19d60b7bd12a61a741 : Improvement of Dopany Concentration Control with Acoustic Control System for B-SiGe Epitaxy Deposition (PDF) |
| 61e190c941a5910f50bc072113ee24ab - Quest OMS Data Sheet - SPECTOR-HT Ion Beam Sputtering System for Optical Coating | 61e190c941a5910f50bc072113ee24ab : Quest OMS Data Sheet (PDF) |
| 1a3cf26b60895704680f11695413afb2 - WaferEtch Data Sheet - Precision Surface Processing - WaferEtch | 1a3cf26b60895704680f11695413afb2 : WaferEtch Data Sheet (PDF) |
| Db255f6c3a467f19a7fb42a01b192dfa - Accelerating Silicon Carbide Power Electronics Devices into High Volume Manufacturing with Mechanical Dicing System - Optium ADS-800 Advanced Dicing System | Db255f6c3a467f19a7fb42a01b192dfa : Accelerating Silicon Carbide Power Electronics Devices into High Volume Manufacturing with Mechanical Dicing System (PDF) |
| 1774aa29cd2a51be3ae20d1ab230f966 - Veeco PSP White Paper: Wet Etch TSV Reveal Process More Cost Effective Than Dry Etch - Precision Surface Processing - WaferEtch | 1774aa29cd2a51be3ae20d1ab230f966 : Veeco PSP White Paper: Wet Etch TSV Reveal Process More Cost Effective Than Dry Etch (PDF) |
| 9e9d96b6dae289f033ef365b63dc81f5 - Chip Scale Review - Advances in Photoresist Stripping - Precision Surface Processing - WaferEtch | 9e9d96b6dae289f033ef365b63dc81f5 : Chip Scale Review - Advances in Photoresist Stripping (PDF) |
| 6c85fa1bad35f91ec3d242c0a9d8ca4f - Silicon Semiconductor - Wet Beats Dry in 3D Backside Process Study - Precision Surface Processing - WaferEtch | 6c85fa1bad35f91ec3d242c0a9d8ca4f : Silicon Semiconductor - Wet Beats Dry in 3D Backside Process Study (PDF) |
| 5ca0a0fa19e21ffd1b9ba3d7704f1ff3 - Etch, Deposition, and Metrology Options for Cost-Effective Thin-Film Bulk Acoustic Resonator (FBAR) Production - NEXUS IBE-420i Ion Beam Etch System | 5ca0a0fa19e21ffd1b9ba3d7704f1ff3 : Etch, Deposition, and Metrology Options for Cost-Effective Thin-Film Bulk Acoustic Resonator (FBAR) Production (PDF) |
| 5ca0a0fa19e21ffd1b9ba3d7704f1ff3 - Etch, Deposition, and Metrology Options for Cost-Effective Thin-Film Bulk Acoustic Resonator (FBAR) Production - NEXUS IBE-420Si Ion Beam Etch System | 5ca0a0fa19e21ffd1b9ba3d7704f1ff3 : Etch, Deposition, and Metrology Options for Cost-Effective Thin-Film Bulk Acoustic Resonator (FBAR) Production (PDF) |
| 172c705b81647493fd285a986676e08e - Advanced Sensor Fabrication Using Integrated Ion Beam Etch and Ion Beam Deposition Processes - NEXUS IBE-420i Ion Beam Etch System | 172c705b81647493fd285a986676e08e : Advanced Sensor Fabrication Using Integrated Ion Beam Etch and Ion Beam Deposition Processes (PDF) |
| 61e190c941a5910f50bc072113ee24ab - Quest OMS Data Sheet - Quest Broadband Optical Monitor for Optical Coating Manufacturers | 61e190c941a5910f50bc072113ee24ab : Quest OMS Data Sheet (PDF) |
| 172c705b81647493fd285a986676e08e - Advanced Sensor Fabrication Using Integrated Ion Beam Etch and Ion Beam Deposition Processes - NEXUS IBE-420Si Ion Beam Etch System | 172c705b81647493fd285a986676e08e : Advanced Sensor Fabrication Using Integrated Ion Beam Etch and Ion Beam Deposition Processes (PDF) |
| 5ca0a0fa19e21ffd1b9ba3d7704f1ff3 - Etch, Deposition, and Metrology Options for Cost-Effective Thin-Film Bulk Acoustic Resonator (FBAR) Production - NEXUS IBE-350Se Ion Beam Etch System | 5ca0a0fa19e21ffd1b9ba3d7704f1ff3 : Etch, Deposition, and Metrology Options for Cost-Effective Thin-Film Bulk Acoustic Resonator (FBAR) Production (PDF) |
| 5ca0a0fa19e21ffd1b9ba3d7704f1ff3 - Etch, Deposition, and Metrology Options for Cost-Effective Thin-Film Bulk Acoustic Resonator (FBAR) Production - NEXUS IBD Ion Beam Deposition System | 5ca0a0fa19e21ffd1b9ba3d7704f1ff3 : Etch, Deposition, and Metrology Options for Cost-Effective Thin-Film Bulk Acoustic Resonator (FBAR) Production (PDF) |
| 5ca0a0fa19e21ffd1b9ba3d7704f1ff3 - Etch, Deposition, and Metrology Options for Cost-Effective Thin-Film Bulk Acoustic Resonator (FBAR) Production - NEXUS IBE-350Si Ion Beam Etch System | 5ca0a0fa19e21ffd1b9ba3d7704f1ff3 : Etch, Deposition, and Metrology Options for Cost-Effective Thin-Film Bulk Acoustic Resonator (FBAR) Production (PDF) |
| 172c705b81647493fd285a986676e08e - Advanced Sensor Fabrication Using Integrated Ion Beam Etch and Ion Beam Deposition Processes - NEXUS IBE-350Se Ion Beam Etch System | 172c705b81647493fd285a986676e08e : Advanced Sensor Fabrication Using Integrated Ion Beam Etch and Ion Beam Deposition Processes (PDF) |
| 172c705b81647493fd285a986676e08e - Advanced Sensor Fabrication Using Integrated Ion Beam Etch and Ion Beam Deposition Processes - NEXUS IBD Ion Beam Deposition System | 172c705b81647493fd285a986676e08e : Advanced Sensor Fabrication Using Integrated Ion Beam Etch and Ion Beam Deposition Processes (PDF) |
| 172c705b81647493fd285a986676e08e - Advanced Sensor Fabrication Using Integrated Ion Beam Etch and Ion Beam Deposition Processes - NEXUS IBE-350Si Ion Beam Etch System | 172c705b81647493fd285a986676e08e : Advanced Sensor Fabrication Using Integrated Ion Beam Etch and Ion Beam Deposition Processes (PDF) |
| 5ff68c28300e8ec266da97cd3403f191 - GENxplor R&D MBE System Data Sheet - GENxplor™ R&D Molecular Beam Epitaxy (MBE) System | 5ff68c28300e8ec266da97cd3403f191 : GENxplor R&D MBE System Data Sheet (PDF) |
| 9f176b0b3fa99aac6670d77a212bf675 - Nova Ultra High Temperature Substrate Heater - GENxplor™ R&D Molecular Beam Epitaxy (MBE) System | 9f176b0b3fa99aac6670d77a212bf675 : Nova Ultra High Temperature Substrate Heater (PDF) |
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